Tailoring 2D and 3D interference structures via multi-parameter control in a 3+1 beam laser interference system

Achieving precise 3D geometric control in Laser Interference Lithography (LIL) is vital. This study simulates a 3+1 beam LIL system, exploring how wave vector, polarization, and phase modulation impact 2D/3D pattern symmetry and morphology. We found phase shifts translate patterns, polarization rotation reshapes motifs, and wave vector changes alter lattice symmetry. Thus, wave vector governs periodicity/symmetry, polarization controls morphology, and phase tunes position. This decoupled parameter control in 3+1 LIL allows fabrication of programmable structures for advanced photonics and materials.