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Superlens-enhanced laser interference lithography

  • Zuobin Wang
    ,
  • Xudong Guo
    ,
  • Li Li
    ,
  • Yaowei Hu
    ,
  • Liang Cao
    ,
  • Litong Dong
  • Changchun University of Science and Technology
    ,
  • University of Warwick
Research Output: Contribution to journal Article Peer-review

Open access

Abstract

A one-step lithography method based on a superlens is proposed to fabricate diffraction-unlimited metallic patterns. By controlling the material parameters and the distribution of the impinging energy, various phenomena, such as periodic nanonetworks, ultrathin nanowires (sub-50-nm feature size), and variable-sized nanoparticles (ranging from sub-10nm to several hundreds of nanometers), are fabricated using a 1,064-nm nanosecond laser. The evolution pathway of such phenomena is explained by the dewetting process of metallic films. The direct-writing performance of a transparent material with a superlens is studied, and the maximum etching depth of Si gratings can reach 2 μm under a single laser pulse, with fine profiles. © 2018 The Japan Society of Applied Physics

Publication Information

Output type

Research Output: Contribution to journal Article Peer-review

Original language

English

Pages from-to (Number of pages)

Pages 125201

Journal (Volume, Issue Number)

Applied Physics Express (Volume 11, Issue 12)

Publication milestones

  • Accepted/In press - 22/10/2018
  • Published - 14/11/2018

Publication status

Published - 14/11/2018

ISSN

1882-0778

External Publication IDs

  • handle.net: 10547/623557
  • Scopus: 85056694862

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