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Superhydrophobic dual micro- and nanostructures fabricated by direct laser interference lithography

  • Wenjun Li
    ,
  • Zuobin Wang
    ,
  • Dapeng Wang
    ,
  • Ziang Zhang
    ,
  • Le Zhao
    ,
  • Dayou Li
  • Changchun University of Science and Technology
Research Output: Contribution to journal Article Peer-review

Abstract

A method for the fabrication of highly ordered superhydrophobic dual micro- and nanostructures on silicon by direct laser interference lithography (LIL) is presented. The method offers its innovation that the superhydrophobic dual micro- and nanostructures can be fabricated directly by controlling the process of four-beam laser interference and the use of hydrofluoric acid (HF) to wipe off the silica generated during the process. Different laser fluences, exposure durations, and cleanout times have been investigated to obtain the optimum value of the contact angle (CA). The superhydrophobic surface with the CA of 153.2 deg was achieved after exposure of 60 s and immersion in HF with a concentration of 5% for 3 min. Compared with other approaches, it is a facile and efficient method with its significant feature for the macroscale fabrication of highly ordered superhydrophobic dual micro- and nanostructures on silicon.

Publication Information

Output type

Research Output: Contribution to journal Article Peer-review

Original language

English

Journal (Volume, Issue Number)

Optical Engineering

Publication milestones

  • Published - 01/01/2014

Publication status

Published - 01/01/2014

ISSN

0091-3286

External Publication IDs

  • handle.net: 10547/336059
  • Scopus: 84897137158

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