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Study of SU-8 photoresist cross-linking process by atomic force acoustic microscopy

  • Yujing Zhao
    ,
  • Yan Liu
    ,
  • Zuobin Wang
    ,
  • Lu Wang
    ,
  • Li Li
    ,
  • F. Hou
  • Changchun University of Science and Technology
Research Output:
Contribution to journal
Article
 Peer-review

Abstract

In this paper, a method is presented to detect the different phases of epoxy cross-linking process and the subsurface structures of SU-8 thin films by atomic force acoustic microscopy (AFAM). The AFAM imaging of SU-8 thin films was investigated under different exposure and bake conditions. Optimized conditions were obtained for the cross-linking of SU-8 thin film at the exposure does of eight laser pulses with the laser fluence 10 mJ cm-2 per pulse and the post exposure bake (PEB) time at 90 s. The subsurface structures of undeveloped SU-8 thin films were visible in the AFAM images. This method provides an effective and low-cost way for the determination of different phases of epoxy cross-linking process in nanostructured compounds, for the non-destructive testing of subsurface defects, and for the evaluation of the quality of patterned structures.

Publication Information

Output type

Research Output:
Contribution to journal
Article
 Peer-review

Original language

English

Pages from-to (Number of pages)

Pages 136-144

Journal (Volume, Issue Number)

Journal of Microscopy (Volume 276, Issue 3)

Publication milestones

  • Published - 26/11/2019

Publication status

Published - 26/11/2019

ISSN

0022-2720

Publication IDs

  • handle.net: 10547/624096
  • Scopus: 85076180161

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