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Periodic antireflection surface structure fabricated on silicon by four-beam laser interference lithography

  • Z. Zhang
    ,
  • Zuobin Wang
    ,
  • Di Wang
    ,
  • Yu-jie Ding
  • Changchun University of Science and Technology
    ,
  • CAS - National Astronomical Observatories
    ,
  • University of Bedfordshire
Research Output: Contribution to journal Article Peer-review

Abstract

Silicon surface structures with excellent antireflection property arouse wide interest. Chemical and physical methods such as femtosecond, nanosecond, and picosecond laser processing, wet-chemical etching, electrochemical etching, and reactive ion etching have been developed to fabricate them. However, the methods can only produce a quasi-ordered array of sharp conical microspikes on silicon surface. In this paper, we present a method to fabricate periodic silicon antireflection surface structures using direct four-beam laser interference lithography (LIL). With 1 atm ambient atmosphere of SF6 and the laser fluence of the four beams irradiated on the silicon surface at 0.64 J cm-2, the periodical conical spikes were generated. Changing the polarization directions of the opposite incident beam pairs in a four-beam LIL system could convert conical spikes structure into an array of holes. Antireflection in a wide spectral range was measured by a spectrophotometer from ultraviolet to near-infrared. The average reflectance of this periodic black silicon surface is less than 3.5%. © 2014 Laser Institute of America.

Publication Information

Output type

Research Output: Contribution to journal Article Peer-review

Original language

English

Pages from-to (Number of pages)

Pages 012010

Journal (Volume, Issue Number)

Journal of Laser Applications (Volume 26, Issue 1)

Publication milestones

  • Accepted/In press - 01/12/2013
  • Published - 31/12/2013

Publication status

Published - 31/12/2013

ISSN

1042-346X

External Publication IDs

  • handle.net: 10547/624289
  • Scopus: 84891689985

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