Skip to search boxSkip to navigationSkip to main content

Micro and nano dual-scale structures fabricated by amplitude modulation in multi-beam laser interference lithography

  • Ziang Zhang
    ,
  • Litong Dong
    ,
  • Yunfeng Ding
    ,
  • Li Li
    ,
  • Zhankun Weng
    ,
  • Zuobin Wang
  • Changchun University of Science and Technology
    ,
  • CAS - National Astronomical Observatories
Research Output: Contribution to journal Article Peer-review

Open access

Abstract

In this work, an effective method was presented to obtain a specific micro and nano dual-structures by amplitude modulation in multi-beam laser interference lithography (LIL). Moiré effect was applied to generate the amplitude modulation. The specific intensity modulation patterns can be obtained by the control of the parameter settings of incident laser beams. Both the incident angle and azimuth angle asymmetric configurations can cause the amplitude modulation in the interference optic field and the modulation period is determined by the angle offset. A four-beam LIL system was set up to fabricate patterns on photoresist and verify the method. The experimental results are in good agreement with the theoretical analysis.

Publication Information

Output type

Research Output: Contribution to journal Article Peer-review

Original language

English

Pages from-to (Number of pages)

Pages 29135-29142

Journal (Volume, Issue Number)

Optics Express (Volume 25, Issue 23)

Publication milestones

  • Accepted/In press - 13/09/2017
  • Published - 08/11/2017

Publication status

Published - 08/11/2017

External Publication IDs

  • handle.net: 10547/623567
  • Scopus: 85033597732

Access to documents

Publication metrics

Metrics

Download statistics
Download count
9