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Interference system for high pressure environment

  • Tero Kumpulainen
    ,
  • Amandeep Singh
    ,
  • Thomas März
    ,
  • Litong Dong
    ,
  • Jarno Reuna
    ,
  • Jorma Vihinen
  • Tampere University
    ,
  • InnoLas Laser GmbH
Research Output: Contribution to journal Article Peer-review

Open access

Abstract

Laser interference patterning or lithography has been used in variety of the applications using, patterning, masking and processing structures at top of material. It offers fast processing over as large areas can be processed simultaneously. Additionally, fine patterns are possible to achieve both in micro and sub-micro scale. In this manuscript is presented novel concept to combine interference patterning and high-pressure processing environment. With aid of high-pressure system, it is possible to control processing environment and add co-solvents in desired state (liquid, gas, supercritical) and use developed system as controlled reactive environment in the future studies. Two systems were developed and assembled for testing and proofing the concept. The results of the two 4-beam interference systems (lens- and mirror-based) are presented and compared.

Publication Information

Output type

Research Output: Contribution to journal Article Peer-review

Original language

English

Article number

107278

Journal (Volume, Issue Number)

Optics and Laser Technology (Volume 142, Issue 107278)

Publication milestones

  • Accepted/In press - 20/05/2021
  • Published - 29/05/2021

Publication status

Published - 29/05/2021

ISSN

0030-3992

External Publication IDs

  • handle.net: 10547/625016
  • Scopus: 85107152164

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