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Fabrication of three-dimensional Si-Au hierarchical nanostructures by laser interference lithography

  • Litong Dong
    ,
  • Lu Wang
    ,
  • Mengnan Liu
    ,
  • Miao Yu
    ,
  • Zuobin Wang
    ,
  • Ziang Zhang
  • Changchun University of Science and Technology
Research Output: Chapter in Book/Report/Conference proceeding Conference contribution Peer-review

Abstract

This paper reports a method for the fabrication of 3D Si-Au hierarchical nanostructures to improve the optical performances through four-beam laser interference lithography (LIL) and inductively coupled plasma (ICP) etching. The 3D Si-Au hierarchical nanostructures were composed of silicon tapered pillar arrays, Au grids, and Au islands, and they demonstrated wide-angle antireflective properties less than 25% reflection in the entire visible wavelengths. In addition, many special properties could be obtained by displacing the islands and grid of the hierarchical structure with other metal material due to the flexibility of LIL and ICP etching.

Publication Information

Output type

Research Output: Chapter in Book/Report/Conference proceeding Conference contribution Peer-review

Original language

English

Pages from-to (Number of pages)

Pages 197-200

Publication milestones

  • Published - 29/11/2018

Publication status

Published - 29/11/2018

Publisher

Institute of Electrical and Electronics Engineers Inc., United States

ISBN (Print)

9781538662144

External Publication IDs

  • handle.net: 10547/623826
  • Scopus: 85059989992

Host publication title

2018 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)

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