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Fabrication of Pt nanowires with a diffraction-unlimited feature size by high-threshold lithography

  • Li Li
    ,
  • Zuobin Wang
    ,
  • Wenjun Li
    ,
  • Kuiqing Peng
    ,
  • Ziang Zhang
    ,
  • Miao Yu
  • Changchun University of Science and Technology
    ,
  • Beijing Normal University
Research Output: Contribution to journal Article Peer-review

Abstract

Although the nanoscale world can already be observed at a diffraction-unlimited resolution using far-field optical microscopy, to make the step from microscopy to lithography still requires a suitable photoresist material system. In this letter, we consider the threshold to be a region with a width characterized by the extreme feature size obtained using a Gaussian beam spot. By narrowing such a region through improvement of the threshold sensitization to intensity in a high-threshold material system, the minimal feature size becomes smaller. By using platinum as the negative photoresist, we demonstrate that high-threshold lithography can be used to fabricate nanowire arrays with a scalable resolution along the axial direction of the linewidth from the micro- to the nanoscale using a nanosecond-pulsed laser source with a wavelength λ0 = 1064 nm. The minimal feature size is only several nanometers (sub λ0/100). Compared with conventional polymer resist lithography, the advantages of high-threshold lithography are sharper pinpoints of laser intensity triggering the threshold response and also higher robustness allowing for large area exposure by a less-expensive nanosecond-pulsed laser.

Publication Information

Output type

Research Output: Contribution to journal Article Peer-review

Original language

English

Journal (Volume, Issue Number)

Applied Physics Letters (Volume 107, Issue 13)

Publication milestones

  • Published - 29/09/2015

Publication status

Published - 29/09/2015

ISSN

0003-6951

External Publication IDs

  • handle.net: 10547/624434
  • Scopus: 84942867327

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