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Fabrication of moth-eye structures on silicon by direct six-beam laser interference lithography

  • Jia Xu
    ,
  • Zuobin Wang
    ,
  • Ziang Zhang
    ,
  • Dapeng Wang
    ,
  • Zhankun Weng
  • Changchun University of Science and Technology
Research Output: Contribution to journal Article Peer-review

Abstract

This paper presents a new method for the generation of cross-scale laser interference patterns and the fabrication of moth-eye structures on silicon. In the method, moth-eye structures were produced on a surface of silicon wafer using direct six-beam laser interference lithography to improve the antireflection performance of the material surface. The periodic dot arrays of the moth-eye structures were formed due to the ablation of the irradiance distribution of interference patterns on the wafer surface. The shape, size, and distribution of the moth-eye structures can be adjusted by controlling the wavelength, incidence angles, and exposure doses in a direct six-beam laser interference lithography setup. The theoretical and experimental results have shown that direct six-beam laser interference lithography can provide a way to fabricate cross-scale moth-eye structures for antireflection applications. © 2014 AIP Publishing LLC.

Publication Information

Output type

Research Output: Contribution to journal Article Peer-review

Original language

English

Pages from-to (Number of pages)

Pages 203101

Journal (Volume, Issue Number)

Journal of Applied Physics (Volume 115, Issue 20)

Publication milestones

  • Accepted/In press - 30/04/2014
  • Published - 22/05/2014

Publication status

Published - 22/05/2014

ISSN

0021-8979

External Publication IDs

  • handle.net: 10547/624272
  • Scopus: 84901992207

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