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Error factors affecting the result of Laser Interference Lithography

  • Jin Zhang
    ,
  • Shilei Jiang
    ,
  • Chunlei Tan
    ,
  • Zuobin Wang
    ,
  • Dayou Li
    ,
  • Yong Yue
  • Xi'an Technological University
    ,
  • Tampere University
Research Output: Chapter in Book/Report/Conference proceeding Conference contribution Peer-review

Abstract

Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.

Publication Information

Output type

Research Output: Chapter in Book/Report/Conference proceeding Conference contribution Peer-review

Original language

English

Publication milestones

  • Published - 01/08/2013

Publication status

Published - 01/08/2013

Publisher

Institute of Electrical and Electronics Engineers Inc., United States

ISBN (Print)

9781479912100

ISBN (Electronic)

9781479912100

External Publication IDs

  • handle.net: 10547/336061
  • Scopus: 84896758647

Host publication title

2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale

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