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Effects of polarization on four-beam laser interference lithography

  • Dapeng Wang
    ,
  • Zuobin Wang
    ,
  • Ziang Zhang
    ,
  • Yong Yue
    ,
  • Dayou Li
    ,
  • Carsten Maple
  • Changchun University of Science and Technology
Research Output: Contribution to journal Article Peer-review

Abstract

This paper demonstrates that polarization plays an important role in the formation of interference patterns, pattern contrasts, and periods in four-beam interference lithography. Three different polarization modes are presented to study the effects of polarization on four-beam laser interference based on theoretical analysis, simulations, and experiments. A four-beam laser interference system was set up to modify the silicon surface. It was found that the secondary periodicity or modulation was the result of the misaligned or unequal incident angles only in the case of the TE-TE-TM-TM mode. The resulting patterns have shown a good correspondence with the theoretical analysis and simulations.

Publication Information

Output type

Research Output: Contribution to journal Article Peer-review

Original language

English

Journal (Volume, Issue Number)

Applied Physics Letters

Publication milestones

  • Published - 01/01/2013

Publication status

Published - 01/01/2013

ISSN

0003-6951

External Publication IDs

  • handle.net: 10547/275814
  • Scopus: 84874878348

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