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Effective intensity distributions used for direct laser interference exposure

  • Jia Xu
    ,
  • Zuobin Wang
    ,
  • Ziang Zhang
    ,
  • Dapeng Wang
    ,
  • Zhankun Weng
  • Changchun University of Science and Technology
    ,
  • CAS - Changchun Institute of Optics Fine Mechanics and Physics
Research Output: Contribution to journal Article Peer-review

Abstract

This paper presents a method to obtain periodic structures with different feature shapes using direct laser interference lithography. In the method, the desired structures are produced by controlling the effective intensity distributions of interference patterns during the exposure process. The effective intensity distributions are adjusted by changing the exposure beam intensity based on the material modification thresholds. In the simulations and experiments, different exposure intensities were used to study the interactions between the effective intensity distributions and the materials, and direct four- and six-beam laser interference lithography systems were set up to pattern silicon wafers. The shapes and sizes of the fabricated surface structures changed with the effective intensities. The experimental results are in accordance with the theoretical models and simulations.

Publication Information

Output type

Research Output: Contribution to journal Article Peer-review

Original language

English

Pages from-to (Number of pages)

Pages 54947-54951

Journal (Volume, Issue Number)

RSC Advances (Volume 5, Issue 68)

Publication milestones

  • Accepted/In press - 12/06/2015
  • Published - 12/06/2015

Publication status

Published - 12/06/2015

External Publication IDs

  • handle.net: 10547/624274
  • Scopus: 84933564464

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