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Direct laser interference technology and potential applications

  • Yong Yue
    ,
  • Dapeng Wang
    ,
  • Ziang Zhang
    ,
  • Carsten Maple
    ,
  • Zuobin Wang
    ,
  • Dayou Li
  • Changchun University of Science and Technology
    ,
  • Xi'an Jiaotong-Liverpool University
Research Output: Chapter in Book/Report/Conference proceeding Conference contribution Peer-review

Abstract

Development of direct laser interference technology (DLIT) is reviewed in this paper. With the merits of being independent on the pretreatment, mask and pattern transfer processes, DLIT is demonstrated a facile and efficient method of producing sub-micro structures on various material surfaces. From a representative perspective, a number of past achievements, containing theoretical and practice aspects, attained by the nanosecond, picosecond, and femtosecond laser interference techniques are introduced. Advantages and limitations in comparison to one another are also addressed. With the progress of the emerging subwavelength structures (e.g. metasurfaces, plasmonic structures) offering the fascinating possibility of controlling the behaviour of light in an unprecedented way, the perspectives of potential applications benefited from DLIT are finally given.

Publication Information

Output type

Research Output: Chapter in Book/Report/Conference proceeding Conference contribution Peer-review

Original language

English

Pages from-to (Number of pages)

Pages 351-354

Publication milestones

  • Published - 12/03/2015

Publication status

Published - 12/03/2015

Publisher

Institute of Electrical and Electronics Engineers Inc., United States

ISBN (Print)

9781479979233

External Publication IDs

  • handle.net: 10547/624275
  • Scopus: 84946690850

Host publication title

2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)

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