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Design an asymmetrical three-beam laser interference lithography for fabricating micro- and nano-structures

  • Litong Dong
    ,
  • Ziang Zhang
    ,
  • Zuobin Wang
    ,
  • Dayou Li
    ,
  • Mengnan Liu
  • Changchun University of Science and Technology
Research Output: Contribution to journal Article Peer-review

Open access

Abstract

Multi-beam laser interference lithography (LIL) has become one of the most important techniques and shown significant advantages in the fabrication of micro- and nano-structures. Controlling inten-sity ratio of optical distributions is a key issue in LIL for fabricating micro- and nano-structures. This paper presents an asymmetrical three-beam LIL system which effectively improves the intensity ratio of optical distributions. Comparing with the symmetrical three-beam interference, the asymmetrical three-beam LIL achieved the high intensity ratio of optical distribution when producing the similar interference pattern. In addition, this system also avoids modulation patterns in multi-beam LIL sys-tems and reduces the difficulty of actual LIL processing. A fast Fourier Transform (FFT) analysis used to study the pattern distributions of the asymmetrical three-beam interference from frequency spectra which shows that the pattern with a high-intensity array can be obtained by adjusting the parameter settings of incident laser beams. The asymmetrical three-beam LIL system was verified through fab-ricating patterns. The experimental results are in good agreement with the theoretical analyses.

Publication Information

Output type

Research Output: Contribution to journal Article Peer-review

Original language

English

Pages from-to (Number of pages)

Pages 85-91

Journal (Volume, Issue Number)

Journal of Laser Micro Nanoengineering (Volume 15, Issue 2)

Publication milestones

  • Accepted/In press - 27/07/2020
  • Published - 01/09/2020

Publication status

Published - 01/09/2020

External Publication IDs

  • handle.net: 10547/624584
  • Scopus: 85091822084

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