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Anti-reflection structures fabricated by direct laser interference technology under different ambiances

  • Dapeng Wang
    ,
  • Yong Yue
    ,
  • Ziang Zhang
    ,
  • Dayou Li
    ,
  • Carsten Maple
    ,
  • Zuobin Wang
  • Changchun University of Science and Technology
Research Output:
Chapter in Book/Report/Conference proceeding
Conference contribution
 Peer-review

Abstract

In this paper, we take the strategy of direct laser interference technology to modify the silicon surface under air and sulphur hexafluoride (SF6) gas ambiance conditions. With the investigation of optical properties, the silicon spike structures (known as black silicon) which were fabricated in the SF6 ambiance showed the excellent ability of reducing light reflection with a broadband spectrum. For comparison, well-defined microcone structures were fabricated in the air ambiance. After hydrofluoric (HF) acid wiping off the oxides on the surface, micro cone structures have shown the anti-reflection function as well and its reflective behaviour was dependent on the structural depth relatively. Due to a high impurities concentration of spike structures obtained in the SF6 ambiance, applications of sulphur-doped black silicon would be limited. To obtain large-scale uniform structures, direct laser interference technology in the air ambiance could be an alternative.

Publication Information

Output type

Research Output:
Chapter in Book/Report/Conference proceeding
Conference contribution
 Peer-review

Original language

English

Publication milestones

  • Published - 13/02/2014

Publication status

Published - 13/02/2014

Publisher

Institute of Electrical and Electronics Engineers Inc., United States

ISBN (Print)

9781479912100

ISBN (Electronic)

9781479912100

Publication IDs

  • handle.net: 10547/336164
  • Scopus: 84896744100

Host publication title

2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale

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Related Event

Title

2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale

Description

2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (26/08/2013-30/08/2013, Suzhou)

Event type

Conference

Date

26/08/2013 - 30/08/2013

Location

Suzhou