3+1 beam laser interference lithography for preparing 3D nanostructures
- Xiaokun Liang,
- Litong Dong,
- Mengnan Liu,
- ,
- Zuobin Wang
- Changchun University of Science and Technology
Research Output: Chapter in Book/Report/Conference proceeding Conference contribution Peer-review
Abstract
Targeting the demand for three-dimensional (3D) micro/nanostructure fabrication, we systematically investigate the optical field formation mechanism in non-coplanar 3+1 beams interference. It specifically elucidates the governing role of the coherent beams' incidence angle in controlling the aspect ratio of the interference patterns. Based on this theoretical framework, the 3+1 beam laser interference lithography system was constructed for studying the 3D periodic nanostructures.
Publication Information
Output type
Research Output: Chapter in Book/Report/Conference proceeding Conference contribution Peer-review
Original language
EnglishPages from-to (Number of pages)
Pages 46-49 (4 pages)Publication milestones
- Published - 02/12/2025
Publication status
Published - 02/12/2025
Publisher
Institute of Electrical and Electronics Engineers Inc., United StatesPublication series
- Publication series name: 2025 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2025 - Conference Proceedings
ISBN (Print)
9798331543686ISBN (Electronic)
9798331543679External Publication IDs
- Scopus: 105030462138
Host publication title
2025 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2025 - Conference ProceedingsHost publication editors
- Miao Yu
- Yi Zeng
- Bowei Wang
- Junxi Wang
- Hao Wu
- Dongxu Wang
- Zhengxun Song
- Zuobin Wang