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Tailoring 2D and 3D interference structures via multi-parameter control in a 3+1 beam laser interference system

  • Amir Hamza
  • , Li Li
  • , Zuobin Wang
  • , Dayou Li
  • Changchun University of Science and Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Achieving precise 3D geometric control in Laser Interference Lithography (LIL) is vital. This study simulates a 3+1 beam LIL system, exploring how wave vector, polarization, and phase modulation impact 2D/3D pattern symmetry and morphology. We found phase shifts translate patterns, polarization rotation reshapes motifs, and wave vector changes alter lattice symmetry. Thus, wave vector governs periodicity/symmetry, polarization controls morphology, and phase tunes position. This decoupled parameter control in 3+1 LIL allows fabrication of programmable structures for advanced photonics and materials.

Original languageEnglish
Title of host publication2025 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2025 - Conference Proceedings
EditorsMiao Yu, Yi Zeng, Bowei Wang, Junxi Wang, Hao Wu, Dongxu Wang, Zhengxun Song, Zuobin Wang
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages471-475
Number of pages5
ISBN (Electronic)9798331543679
ISBN (Print)9798331543686
DOIs
Publication statusPublished - 2 Dec 2025
Event2025 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2025 - Changchun, China
Duration: 28 Jul 20251 Aug 2025

Publication series

Name2025 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2025 - Conference Proceedings

Conference

Conference2025 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2025
Country/TerritoryChina
CityChangchun
Period28/07/251/08/25

Keywords

  • Fabrication
  • Laser Interference Lithography
  • Multiparameter Modulation

ASJC Scopus subject areas

  • Biotechnology
  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering
  • Electronic, Optical and Magnetic Materials
  • Instrumentation

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