TY - GEN
T1 - Tailoring 2D and 3D interference structures via multi-parameter control in a 3+1 beam laser interference system
AU - Hamza, Amir
AU - Li, Li
AU - Wang, Zuobin
AU - Li, Dayou
N1 - Publisher Copyright:
© 2025 IEEE.
PY - 2025/12/2
Y1 - 2025/12/2
N2 - Achieving precise 3D geometric control in Laser Interference Lithography (LIL) is vital. This study simulates a 3+1 beam LIL system, exploring how wave vector, polarization, and phase modulation impact 2D/3D pattern symmetry and morphology. We found phase shifts translate patterns, polarization rotation reshapes motifs, and wave vector changes alter lattice symmetry. Thus, wave vector governs periodicity/symmetry, polarization controls morphology, and phase tunes position. This decoupled parameter control in 3+1 LIL allows fabrication of programmable structures for advanced photonics and materials.
AB - Achieving precise 3D geometric control in Laser Interference Lithography (LIL) is vital. This study simulates a 3+1 beam LIL system, exploring how wave vector, polarization, and phase modulation impact 2D/3D pattern symmetry and morphology. We found phase shifts translate patterns, polarization rotation reshapes motifs, and wave vector changes alter lattice symmetry. Thus, wave vector governs periodicity/symmetry, polarization controls morphology, and phase tunes position. This decoupled parameter control in 3+1 LIL allows fabrication of programmable structures for advanced photonics and materials.
KW - Fabrication
KW - Laser Interference Lithography
KW - Multiparameter Modulation
UR - https://www.scopus.com/pages/publications/105030499845
U2 - 10.1109/3M-NANO65639.2025.11261020
DO - 10.1109/3M-NANO65639.2025.11261020
M3 - Conference contribution
AN - SCOPUS:105030499845
SN - 9798331543686
T3 - 2025 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2025 - Conference Proceedings
SP - 471
EP - 475
BT - 2025 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2025 - Conference Proceedings
A2 - Yu, Miao
A2 - Zeng, Yi
A2 - Wang, Bowei
A2 - Wang, Junxi
A2 - Wu, Hao
A2 - Wang, Dongxu
A2 - Song, Zhengxun
A2 - Wang, Zuobin
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2025 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2025
Y2 - 28 July 2025 through 1 August 2025
ER -