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Periodic silicon metasurfaces for high performance structural color

  • Zhihui Ma
  • , Lu Wang
  • , Zhongliang Qiao
  • , Litong Dong
  • , Mengnan Liu
  • , Ojo S. Fayomi
  • , Liguo Tian
  • , Dayou Li
  • , Yujuan Chen
  • Changchun University of Science and Technology
  • Hainan Normal University
  • Bells University of Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Structural color can be divided into plasmonic structural color and all-dielectric structural color, and dielectric structural color is becoming the first choice for making structural color because of its high color saturation and low cost. In this work, a large area of silicon-based structural color was fabricated using the Taber effect based on laser interference theory from commercial silicon-on-insulator (SOI) substrates on the basis of FDTD simulation. Consequently, periodic grating silicon metasurfaces with a width of 106 nm can achieve a maximum spectral reflectance of up to 91% at 650-700 nm, which can produce bright red structural color, providing a reliable way for the fabrication of low cost and high performance dielectric structural color at low cost.
Original languageEnglish
Title of host publication2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2024
EditorsYing Wang, Yuxiao Cui, Jingran Zhang, Miao Yu, Hao Wu, Zuobin Wang
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages605-609
Number of pages5
ISBN (Electronic)9798350362107
ISBN (Print)9798350362107
DOIs
Publication statusPublished - 3 Dec 2024
Event2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) - Zhongshan
Duration: 29 Jul 20242 Aug 2024

Publication series

Name2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2024

Conference

Conference2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)
CityZhongshan
Period29/07/242/08/24
Other2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) (29/07/2024-02/08/2024, Zhongshan)

Keywords

  • all-dielectric material
  • metasurface
  • structural color

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering
  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Biotechnology
  • Electrical and Electronic Engineering

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