Fabrication of three-dimensional Si-Au hierarchical nanostructures by laser interference lithography

Litong Dong; Lu Wang; Mengnan Liu; Miao Yu; Zuobin Wang; Ziang Zhang; Dayou Li

doi:10.1109/3M-NANO.2018.8552170

Fabrication of three-dimensional Si-Au hierarchical nanostructures by laser interference lithography

Litong Dong
, Lu Wang
, Mengnan Liu
, Miao Yu
, Zuobin Wang
, Ziang Zhang
, Dayou Li

Changchun University of Science and Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

This paper reports a method for the fabrication of 3D Si-Au hierarchical nanostructures to improve the optical performances through four-beam laser interference lithography (LIL) and inductively coupled plasma (ICP) etching. The 3D Si-Au hierarchical nanostructures were composed of silicon tapered pillar arrays, Au grids, and Au islands, and they demonstrated wide-angle antireflective properties less than 25% reflection in the entire visible wavelengths. In addition, many special properties could be obtained by displacing the islands and grid of the hierarchical structure with other metal material due to the flexibility of LIL and ICP etching.

Original language	English
Title of host publication	nan
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	197-200
ISBN (Print)	9781538662144
DOIs	https://doi.org/10.1109/3M-NANO.2018.8552170
Publication status	Published - 29 Nov 2018
Event	IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) - Hangzhou Duration: 13 Aug 2018 → 17 Aug 2018

Conference

Conference	IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)
City	Hangzhou
Period	13/08/18 → 17/08/18
Other	IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) (13/08/2018-17/08/2018, Hangzhou)

Keywords

Antireflection
ICP etching
Laser interference lithography
hierarchical nanostructure

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10.1109/3M-NANO.2018.8552170

https://ieeexplore.ieee.org/document/8552170

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@inproceedings{56a0b31fecce46839d8672a9a9ad5202,

title = "Fabrication of three-dimensional Si-Au hierarchical nanostructures by laser interference lithography",

abstract = "This paper reports a method for the fabrication of 3D Si-Au hierarchical nanostructures to improve the optical performances through four-beam laser interference lithography (LIL) and inductively coupled plasma (ICP) etching. The 3D Si-Au hierarchical nanostructures were composed of silicon tapered pillar arrays, Au grids, and Au islands, and they demonstrated wide-angle antireflective properties less than 25\% reflection in the entire visible wavelengths. In addition, many special properties could be obtained by displacing the islands and grid of the hierarchical structure with other metal material due to the flexibility of LIL and ICP etching.",

keywords = "Antireflection, ICP etching, Laser interference lithography, hierarchical nanostructure",

author = "Litong Dong and Lu Wang and Mengnan Liu and Miao Yu and Zuobin Wang and Ziang Zhang and Dayou Li",

year = "2018",

month = nov,

day = "29",

doi = "10.1109/3M-NANO.2018.8552170",

language = "English",

isbn = "9781538662144",

pages = "197--200",

booktitle = "nan",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

address = "United States",

note = "IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) ; Conference date: 13-08-2018 Through 17-08-2018",

}

Dong, L, Wang, L, Liu, M, Yu, M, Wang, Z, Zhang, Z & Li, D 2018, Fabrication of three-dimensional Si-Au hierarchical nanostructures by laser interference lithography. in nan. Institute of Electrical and Electronics Engineers Inc., pp. 197-200, IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), Hangzhou, 13/08/18. https://doi.org/10.1109/3M-NANO.2018.8552170

TY - GEN

T1 - Fabrication of three-dimensional Si-Au hierarchical nanostructures by laser interference lithography

AU - Dong, Litong

AU - Wang, Lu

AU - Liu, Mengnan

AU - Yu, Miao

AU - Wang, Zuobin

AU - Zhang, Ziang

AU - Li, Dayou

PY - 2018/11/29

Y1 - 2018/11/29

N2 - This paper reports a method for the fabrication of 3D Si-Au hierarchical nanostructures to improve the optical performances through four-beam laser interference lithography (LIL) and inductively coupled plasma (ICP) etching. The 3D Si-Au hierarchical nanostructures were composed of silicon tapered pillar arrays, Au grids, and Au islands, and they demonstrated wide-angle antireflective properties less than 25% reflection in the entire visible wavelengths. In addition, many special properties could be obtained by displacing the islands and grid of the hierarchical structure with other metal material due to the flexibility of LIL and ICP etching.

AB - This paper reports a method for the fabrication of 3D Si-Au hierarchical nanostructures to improve the optical performances through four-beam laser interference lithography (LIL) and inductively coupled plasma (ICP) etching. The 3D Si-Au hierarchical nanostructures were composed of silicon tapered pillar arrays, Au grids, and Au islands, and they demonstrated wide-angle antireflective properties less than 25% reflection in the entire visible wavelengths. In addition, many special properties could be obtained by displacing the islands and grid of the hierarchical structure with other metal material due to the flexibility of LIL and ICP etching.

KW - Antireflection

KW - ICP etching

KW - Laser interference lithography

KW - hierarchical nanostructure

U2 - 10.1109/3M-NANO.2018.8552170

DO - 10.1109/3M-NANO.2018.8552170

M3 - Conference contribution

SN - 9781538662144

SP - 197

EP - 200

BT - nan

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)

Y2 - 13 August 2018 through 17 August 2018

ER -

Fabrication of three-dimensional Si-Au hierarchical nanostructures by laser interference lithography

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