Error factors affecting the result of Laser Interference Lithography

Jin Zhang; Shilei Jiang; Chunlei Tan; Zuobin Wang; Dayou Li; Yong Yue; Renxi Qiu; Guobin Sun; Lihong Yang; Sanlong Wang

doi:10.1109/3M-NANO.2013.6737387

Error factors affecting the result of Laser Interference Lithography

Jin Zhang
, Shilei Jiang
, Chunlei Tan
, Zuobin Wang
, Dayou Li
, Yong Yue
, Renxi Qiu
, Guobin Sun
, Lihong Yang
, Sanlong Wang

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Citation (Scopus)

Abstract

Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.

Original language	English
Title of host publication	nan
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9781479912100
ISBN (Print)	9781479912100
DOIs	https://doi.org/10.1109/3M-NANO.2013.6737387
Publication status	Published - 1 Aug 2013
Event	2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale - Suzhou Duration: 26 Aug 2013 → 30 Aug 2013

Conference

Conference	2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale
City	Suzhou
Period	26/08/13 → 30/08/13
Other	2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (26/08/2013-30/08/2013, Suzhou)

Keywords

Laser interference lithography

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10.1109/3M-NANO.2013.6737387

https://ieeexplore.ieee.org/document/6737387

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@inproceedings{ec7f5346866e4b6fafd6aadf7ee6c514,

title = "Error factors affecting the result of Laser Interference Lithography",

abstract = "Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.",

keywords = "Laser interference lithography",

author = "Jin Zhang and Shilei Jiang and Chunlei Tan and Zuobin Wang and Dayou Li and Yong Yue and Renxi Qiu and Guobin Sun and Lihong Yang and Sanlong Wang",

year = "2013",

month = aug,

day = "1",

doi = "10.1109/3M-NANO.2013.6737387",

language = "English",

isbn = "9781479912100",

booktitle = "nan",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

address = "United States",

note = "2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale ; Conference date: 26-08-2013 Through 30-08-2013",

}

Zhang, J, Jiang, S, Tan, C, Wang, Z, Li, D, Yue, Y, Qiu, R, Sun, G, Yang, L & Wang, S 2013, Error factors affecting the result of Laser Interference Lithography. in nan. Institute of Electrical and Electronics Engineers Inc., 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, Suzhou, 26/08/13. https://doi.org/10.1109/3M-NANO.2013.6737387

TY - GEN

T1 - Error factors affecting the result of Laser Interference Lithography

AU - Zhang, Jin

AU - Jiang, Shilei

AU - Tan, Chunlei

AU - Wang, Zuobin

AU - Li, Dayou

AU - Yue, Yong

AU - Qiu, Renxi

AU - Sun, Guobin

AU - Yang, Lihong

AU - Wang, Sanlong

PY - 2013/8/1

Y1 - 2013/8/1

N2 - Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.

AB - Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.

KW - Laser interference lithography

U2 - 10.1109/3M-NANO.2013.6737387

DO - 10.1109/3M-NANO.2013.6737387

M3 - Conference contribution

SN - 9781479912100

BT - nan

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale

Y2 - 26 August 2013 through 30 August 2013

ER -

Error factors affecting the result of Laser Interference Lithography

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