Direct laser interference technology and potential applications

Yong Yue; Dapeng Wang; Ziang Zhang; Carsten Maple; Zuobin Wang; Dayou Li; Renxi Qiu

doi:10.1109/3M-NANO.2014.7057359

Direct laser interference technology and potential applications

Yong Yue
, Dapeng Wang
, Ziang Zhang
, Carsten Maple
, Zuobin Wang
, Dayou Li
, Renxi Qiu

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

Development of direct laser interference technology (DLIT) is reviewed in this paper. With the merits of being independent on the pretreatment, mask and pattern transfer processes, DLIT is demonstrated a facile and efficient method of producing sub-micro structures on various material surfaces. From a representative perspective, a number of past achievements, containing theoretical and practice aspects, attained by the nanosecond, picosecond, and femtosecond laser interference techniques are introduced. Advantages and limitations in comparison to one another are also addressed. With the progress of the emerging subwavelength structures (e.g. metasurfaces, plasmonic structures) offering the fascinating possibility of controlling the behaviour of light in an unprecedented way, the perspectives of potential applications benefited from DLIT are finally given.

Original language	English
Title of host publication	2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	351-354
ISBN (Print)	9781479979233
DOIs	https://doi.org/10.1109/3M-NANO.2014.7057359
Publication status	Published - 12 Mar 2015
Event	2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) - Taipei Duration: 27 Oct 2014 → 31 Oct 2014

Conference

Conference	2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)
City	Taipei
Period	27/10/14 → 31/10/14
Other	2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) (27/10/2014-31/10/2014, Taipei)

Keywords

Direct laser interference technology
Nanosecond
picosecond and femtosecond interference

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10.1109/3M-NANO.2014.7057359

https://ieeexplore.ieee.org/abstract/document/7057359

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@inproceedings{a46a62690cb64603b3e0ecfdefd8eb0e,

title = "Direct laser interference technology and potential applications",

abstract = "Development of direct laser interference technology (DLIT) is reviewed in this paper. With the merits of being independent on the pretreatment, mask and pattern transfer processes, DLIT is demonstrated a facile and efficient method of producing sub-micro structures on various material surfaces. From a representative perspective, a number of past achievements, containing theoretical and practice aspects, attained by the nanosecond, picosecond, and femtosecond laser interference techniques are introduced. Advantages and limitations in comparison to one another are also addressed. With the progress of the emerging subwavelength structures (e.g. metasurfaces, plasmonic structures) offering the fascinating possibility of controlling the behaviour of light in an unprecedented way, the perspectives of potential applications benefited from DLIT are finally given.",

keywords = "Direct laser interference technology, Nanosecond, picosecond and femtosecond interference",

author = "Yong Yue and Dapeng Wang and Ziang Zhang and Carsten Maple and Zuobin Wang and Dayou Li and Renxi Qiu",

year = "2015",

month = mar,

day = "12",

doi = "10.1109/3M-NANO.2014.7057359",

language = "English",

isbn = "9781479979233",

pages = "351--354",

booktitle = "2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

address = "United States",

note = "2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) ; Conference date: 27-10-2014 Through 31-10-2014",

}

Yue, Y, Wang, D, Zhang, Z, Maple, C, Wang, Z, Li, D & Qiu, R 2015, Direct laser interference technology and potential applications. in 2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO). Institute of Electrical and Electronics Engineers Inc., pp. 351-354, 2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), Taipei, 27/10/14. https://doi.org/10.1109/3M-NANO.2014.7057359

Direct laser interference technology and potential applications. / Yue, Yong; Wang, Dapeng; Zhang, Ziang et al.
2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO). Institute of Electrical and Electronics Engineers Inc., 2015. p. 351-354.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Direct laser interference technology and potential applications

AU - Yue, Yong

AU - Wang, Dapeng

AU - Zhang, Ziang

AU - Maple, Carsten

AU - Wang, Zuobin

AU - Li, Dayou

AU - Qiu, Renxi

PY - 2015/3/12

Y1 - 2015/3/12

N2 - Development of direct laser interference technology (DLIT) is reviewed in this paper. With the merits of being independent on the pretreatment, mask and pattern transfer processes, DLIT is demonstrated a facile and efficient method of producing sub-micro structures on various material surfaces. From a representative perspective, a number of past achievements, containing theoretical and practice aspects, attained by the nanosecond, picosecond, and femtosecond laser interference techniques are introduced. Advantages and limitations in comparison to one another are also addressed. With the progress of the emerging subwavelength structures (e.g. metasurfaces, plasmonic structures) offering the fascinating possibility of controlling the behaviour of light in an unprecedented way, the perspectives of potential applications benefited from DLIT are finally given.

AB - Development of direct laser interference technology (DLIT) is reviewed in this paper. With the merits of being independent on the pretreatment, mask and pattern transfer processes, DLIT is demonstrated a facile and efficient method of producing sub-micro structures on various material surfaces. From a representative perspective, a number of past achievements, containing theoretical and practice aspects, attained by the nanosecond, picosecond, and femtosecond laser interference techniques are introduced. Advantages and limitations in comparison to one another are also addressed. With the progress of the emerging subwavelength structures (e.g. metasurfaces, plasmonic structures) offering the fascinating possibility of controlling the behaviour of light in an unprecedented way, the perspectives of potential applications benefited from DLIT are finally given.

KW - Direct laser interference technology

KW - Nanosecond

KW - picosecond and femtosecond interference

U2 - 10.1109/3M-NANO.2014.7057359

DO - 10.1109/3M-NANO.2014.7057359

M3 - Conference contribution

SN - 9781479979233

SP - 351

EP - 354

BT - 2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)

Y2 - 27 October 2014 through 31 October 2014

ER -

Direct laser interference technology and potential applications

Abstract

Conference

Keywords

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