Biomimetic moth‑eye structures fabricated by double‑exposure lithography using coplanar three‑beam laser interference

This study presents a coplanar three-beam laser interference lithography (LIL) method for fabricating biomimetic moth-eyestructures. The research delves into the mechanism of cross-scale two-periodic structure formation and devises a doubleexposure lithography approach based on coplanar three-beam interference to regulate the parameters of these structures. A comparison with microlens arrays of the same period reveals that the biomimetic moth-eye structure shows enhanced transmittance and a wider field of view, attributable to its internal nanoscale arrays. The contrast of diffracted light distribution between the two structures further validates that the unique structural features of the biomimetic moth-eye structure lead to a more uniform light distribution. This work offers a facile method for fabricating biomimetic moth-eye structures, holding potential applications in diverse optical domains, including high-efficiency optical sensors, anti-reflective coatings, and advanced imaging systems.